Measures reducing the NO formation by qualified firing (primary measures) are intensively investigated. Fundamental elements in this context are the staging of fuel and combustion air as well as the recirculation of exhaust gas, to control residence time and also temperature and concentration patterns. For prediction, but also for optimization and control of technical combustion processes, simplified models of NO formation are applicable and required. These models should be simplified in a way that allows on-line operation and is capable of reflecting sufficiently the process. The structure of such a model (kinetics, reactors) is described in the present paper. Introducing two model parameters (a characteristic process temperature and a fuel-NO parameter), the model has proved effective in predicting NO formation during combustion of natural gas and also visbreaker residue.
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June 1995
Research Papers
On the Simplified Modeling of NO Formation in Technical Combustion Processes
G. Kloeppner,
G. Kloeppner
Ruhr Oel GMBH, Werk Scholven, Pawikerstrasse 30, D-45896 Gelsenkirchen, Germany
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R. Scholz,
R. Scholz
Institute of Energy Process Technology, Technical University Clausthal, D-38678 Clausthal-Zellerfeld, Germany
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R. Jeschar
R. Jeschar
Institute of Energy Process Technology, Technical University Clausthal, D-38678 Clausthal-Zellerfeld, Germany
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G. Kloeppner
Ruhr Oel GMBH, Werk Scholven, Pawikerstrasse 30, D-45896 Gelsenkirchen, Germany
R. Scholz
Institute of Energy Process Technology, Technical University Clausthal, D-38678 Clausthal-Zellerfeld, Germany
R. Jeschar
Institute of Energy Process Technology, Technical University Clausthal, D-38678 Clausthal-Zellerfeld, Germany
J. Energy Resour. Technol. Jun 1995, 117(2): 161-164 (4 pages)
Published Online: June 1, 1995
Article history
Received:
January 10, 1994
Revised:
January 7, 1995
Online:
January 22, 2008
Citation
Kloeppner, G., Scholz, R., and Jeschar, R. (June 1, 1995). "On the Simplified Modeling of NO Formation in Technical Combustion Processes." ASME. J. Energy Resour. Technol. June 1995; 117(2): 161–164. https://doi.org/10.1115/1.2835333
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