Skip to Main Content
Skip Nav Destination
ASME Press Select Proceedings

International Conference on Mechanical and Electrical Technology, 3rd, (ICMET-China 2011), Volumes 1–3

By
Yi Xie
Yi Xie
Search for other works by this author on:
ISBN:
9780791859810
No. of Pages:
906
Publisher:
ASME Press
Publication date:
2011

Nano Imprint Lithography (NIL) is a nano scale patterning process potentially applicable in various sectors of nanotechnology. But in conventional NIL, a large external pressure has to be used to press a patterned template against fluid (a polymer, for instance) on a substrate so that the fluid hydraulically fills into cavity of the template while compressing the air trapped inside the cavity. Such a large and mechanically applied force will lead to various undesirable distortions in the template or process tool. Application of an electric potential to the template and substrate can generate an electrostatic force to the dielectric fluid...

Abstract
Key Words
1 Introduction
2. Mathematical Model
3. Results and Discussion
6. Summaries
References
This content is only available via PDF.
You do not currently have access to this chapter.
Close Modal

or Create an Account

Close Modal
Close Modal