A nonlinear dynamic model of the chemical vapor deposition (CVD) process has been developed to aid design of a closed-loop control system. A lumped control volume analysis is used to capture important mass and fluid transients and spatial affects, while a simplified single variable equation is used to represent the complex reaction chemistry. Steady-state experimental results and model predictions are compared and the control implications of the process dynamics are discussed.
Dynamic Modeling Analysis for Control of Chemical Vapor Deposition
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Gevelber, M. A., Bufano, M., and Toledo-Quin˜ones, M. (June 1, 1998). "Dynamic Modeling Analysis for Control of Chemical Vapor Deposition." ASME. J. Dyn. Sys., Meas., Control. June 1998; 120(2): 164–169. https://doi.org/10.1115/1.2802405
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