Abstract
We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model. The program provides accurate modeling of etching process with high spatial resolution. Implementation of a dynamic CA technique has resulted in increased simulation speed and reduced memory requirements. A first ACES software based on PC platforms has been realized.
Volume Subject Area:
Computational Methods for Analysis, Design, and Simulation of MEMS
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Copyright © 1998 by The American Society of Mechanical Engineers
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