This article mainly presents the full-scale schlieren technique using modular background-oriented light source instead of the retroreflective method. Moveover, this article is also focused on investigating sensitivity influence of the cutoff light percentage by the cutoff grid. An unit background-oriented light source is composed of the fluorescent lamps of Philips-865, the atomizing film, and the linear grating mask in this work. The applied cutoff grids are with 50, 60, 70, 80, and 90% of the cutoff light percentage respectively. The results show that a cutoff grid with 90% cutoff light for the conventional Z-arrangement schlieren technique and a cutoff grid with 60% cutoff light for the full-scale schlieren technique receives the best visualization.
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ASME 2011 International Mechanical Engineering Congress and Exposition
November 11–17, 2011
Denver, Colorado, USA
Conference Sponsors:
- ASME
ISBN:
978-0-7918-5490-7
PROCEEDINGS PAPER
Developing the Modular Background-Oriented Full-Scale Schlieren Technique
Yu-Cheng Hung,
Yu-Cheng Hung
National Taipei University of Technology, Taiwan
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Chien-Chih Chen,
Chien-Chih Chen
National Taipei University of Technology, Taiwan
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Shun-Chih Wang,
Shun-Chih Wang
Institute of Occupational Safety and Health, Taiwan
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Chen-Ching Ting
Chen-Ching Ting
National Taipei University of Technology, Taiwan
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Yu-Cheng Hung
National Taipei University of Technology, Taiwan
Chien-Chih Chen
National Taipei University of Technology, Taiwan
Shun-Chih Wang
Institute of Occupational Safety and Health, Taiwan
Chen-Ching Ting
National Taipei University of Technology, Taiwan
Paper No:
IMECE2011-63326, pp. 1735-1741; 7 pages
Published Online:
August 1, 2012
Citation
Hung, Y, Chen, C, Wang, S, & Ting, C. "Developing the Modular Background-Oriented Full-Scale Schlieren Technique." Proceedings of the ASME 2011 International Mechanical Engineering Congress and Exposition. Volume 4: Energy Systems Analysis, Thermodynamics and Sustainability; Combustion Science and Engineering; Nanoengineering for Energy, Parts A and B. Denver, Colorado, USA. November 11–17, 2011. pp. 1735-1741. ASME. https://doi.org/10.1115/IMECE2011-63326
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