Abstract
This paper presents design of partially constrained compliant stages for high-resolution (sub 100nm) imprint lithography machines. The kinematic designs of the stages allow passive alignment of two flat surfaces and enable shear-free separation. This stage is a critical component in a new lithography process known as Step and Flash Imprint Lithography (SFIL). The orientation stage requirements are distinct from those used in traditional photolithography since the depth of focus of projection optics allows for larger errors in the alignment process. Experiments have been performed to demonstrate sub 100nm imprints on silicon substrates.
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26th Biennial Mechanisms and Robotics Conference
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